Microlithography: Trends, Challenges, Solutions, and Their Impact on Design

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http://doi.ieeecomputersociety.org/10.1109/MM.2003.1196111

March/April 2003 (vol. 23 no. 2) pp. 12-21

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	ASCII Text	x
	Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," IEEE Micro, vol. 23, no. 2, pp. 12-21, March/April, 2003.

	BibTex	x
	@article{ 10.1109/MM.2003.1196111, author = {Alfred K. Wong}, title = {Microlithography: Trends, Challenges, Solutions, and Their Impact on Design}, journal ={IEEE Micro}, volume = {23}, number = {2}, issn = {0272-1732}, year = {2003}, pages = {12-21}, doi = {http://doi.ieeecomputersociety.org/10.1109/MM.2003.1196111}, publisher = {IEEE Computer Society}, address = {Los Alamitos, CA, USA}, }

	RefWorks Procite/RefMan/Endnote	x
	TY - MGZN JO - IEEE Micro TI - Microlithography: Trends, Challenges, Solutions, and Their Impact on Design IS - 2 SN - 0272-1732 SP12 EP21 EPD - 12-21 A1 - Alfred K. Wong, PY - 2003 VL - 23 JA - IEEE Micro ER -

Alfred K. Wong, University of Hong Kong

With lithography parameters approaching their limits, continuous improvement requires increasing dialogues and compromises between the technology and design communities. Only with such communication can semiconductor manufacturers reach the 30-nm physical-gate-length era with optical lithography.

Citation:

Alfred K. Wong, "Microlithography: Trends, Challenges, Solutions, and Their Impact on Design," IEEE Micro, vol. 23, no. 2, pp. 12-21, Mar./Apr. 2003, doi:10.1109/MM.2003.1196111

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