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Texture Modeling by Optimal Gray Scale Structuring Elements Using Morphological Pattern Spectrum
Barcelona, Spain September 03-September 08
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ICPR.2000.1002215th International Conference on Patt ...
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Miho Miyagawa, Kyushu Institute of Technology
Mitsuhiko Fujio, Kyushu Institute of Technology
Akira Asano, Hiroshima University
This paper proposes a novel texture modeling method based on the pattern spectrum. The pattern spectrum is a mathematical morphological method to describe the size distribution of objects contained in an image. Our method is based on the idea of obtaining a model of the elementary particles that form a texture by optimizing a gray scale-structuring element to fit the shape of elementary particles. The optimization method is applied in two stages: The first stage optimizes the extent of structuring element and the second optimizes the pixel values in the extent.
Citation:
Miho Miyagawa, Mitsuhiko Fujio, Akira Asano, "Texture Modeling by Optimal Gray Scale Structuring Elements Using Morphological Pattern Spectrum," icpr, vol. 3, pp.3479, 15th International Conference on Pattern Recognition (ICPR'00) - Volume 3, 2000
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