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Quality of EDA CAD Tools: Definitions, Metrics and Directions
San Jose, California March 20-March 22
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ISQED.2000.838903First International Symposium on Qual ...
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A.H. Farrahi, IBM T.J. Watson Research Center
D.J. Hathaway, IBM Electronic Design Automation
M. Wang, Northwestern University
M. Sarrafzadeh, Northwestern University
In this paper we survey major problems faced by EDA tools in tackling submicron (DSM) design challenges like: crosstalk, reliability, power, and interconnect dominated delay. We discuss the need for rethinking quality models used in EDA tools to allow early and reliable planning, estimation, analysis, and optimization. Key design quality metrics from a CAD tool perspective are surveyed, and methodologies and directions are proposed for the next generation design automation tools, intended to meet the challenges ahead. Ideas such as forward synthesis, incremental synthesis, system-level interconnect prediction and planning, and their implications on design quality, design tool architecture, and design methodology are explored.
Index Terms:
Design Quality Metrics, Integrated Design Exploration, Incremental Synthesis, Layout-Driven Synthesis' System-Level Interconnect Prediction and Planning, Deep Submicron Designs, Tool Interoperability
Citation:
A.H. Farrahi, D.J. Hathaway, M. Wang, M. Sarrafzadeh, "Quality of EDA CAD Tools: Definitions, Metrics and Directions," isqed, pp.395, First International Symposium on Quality of Electronic Design, 2000
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