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Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts
San Jose, California March 26-March 28
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ISQED.2001.915216International Symposium on Quality El ...
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J.W. McPherson, "Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts," Quality Electronic Design, International Symposium on, pp. 123, International Symposium on Quality Electronic Design (ISQED '01), 2001.
 
 
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@article{ 10.1109/ISQED.2001.915216,
author = {J.W. McPherson},
title = {Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts},
journal ={Quality Electronic Design, International Symposium on},
volume = {0},
year = {2001},
isbn = {0-7695-1025-6},
pages = {123},
doi = {http://doi.ieeecomputersociety.org/10.1109/ISQED.2001.915216},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - Quality Electronic Design, International Symposium on
TI - Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts
SN - 0-7695-1025-6
SP
EP
A1 - J.W. McPherson,
PY - 2001
VL - 0
JA - Quality Electronic Design, International Symposium on
ER -
 
J.W. McPherson, Texas Instruments, Inc.
Scaling, for enhanced performance and cost reduction reasons, has pushed existing CMOS materials much closer to their intrinsic reliability limits. Future robust designs will require a strong team effort whereby the design engineer must clearly understand the process variability and its impact on reliability. This strong team effort, between design and process, will become critically important as the industry is seeking to replace the very materials that has made the industry so successful: Si substrates, SiO2 gate-dielectric, Al-based metallization and SiO2 interconnect-dielectrics.
Citation:
J.W. McPherson, "Scaling-Induced Reductions in CMOS Reliability Margins and the Escalating Need for Increased Design-In Reliability Efforts," isqed, pp.123, International Symposium on Quality Electronic Design (ISQED '01), 2001
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