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Methodology for Automated Layout Migration for 90 nm Itanium®2 Processor Design
San Jose, California March 22-March 24
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ISQED.2004.12836465th International Symposium on Qualit ...
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Kuang-Kuo Lin, Sudhakar Kale, Aditi Nigam, "Methodology for Automated Layout Migration for 90 nm Itanium®2 Processor Design," Quality Electronic Design, International Symposium on, pp. 31-35, 5th International Symposium on Quality Electronic Design (ISQED'04), 2004.
 
 
BibTex
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@article{ 10.1109/ISQED.2004.1283646,
author = {Kuang-Kuo Lin and Sudhakar Kale and Aditi Nigam},
title = {Methodology for Automated Layout Migration for 90 nm Itanium®2 Processor Design},
journal ={Quality Electronic Design, International Symposium on},
volume = {0},
year = {2004},
issn = {2003116307},
pages = {31-35},
doi = {http://doi.ieeecomputersociety.org/10.1109/ISQED.2004.1283646},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - Quality Electronic Design, International Symposium on
TI - Methodology for Automated Layout Migration for 90 nm Itanium®2 Processor Design
SN - 2003116307
SP31
EP35
A1 - Kuang-Kuo Lin,
A1 - Sudhakar Kale,
A1 - Aditi Nigam,
PY - 2004
KW - null
VL - 0
JA - Quality Electronic Design, International Symposium on
ER -
 
Kuang-Kuo Lin, Intel Corporation
Sudhakar Kale, Intel Corporation
Aditi Nigam, Intel Corporation
Unlike past semiconductor manufacturing processes, nanometer technology has seen an exponential growth of complex design rules and constraints. As a result, direct optical shrink of products between process nodes is becoming less feasible. To facilitate aggressive time-to-market requirements by re-using designs under new process technology, new CAD automation tools and methodologies have been developed. This paper describes a process shifting flow of 130nm custom layout to 90nm. Design challenges at the new process will first be overviewed, followed by EDA-assisted layout migration. Finally, productivity gains together with the design qualities will be shown on the implementation of a next generation Itanium?2 server chip.
Citation:
Kuang-Kuo Lin, Sudhakar Kale, Aditi Nigam, "Methodology for Automated Layout Migration for 90 nm Itanium®2 Processor Design," isqed, pp.31-35, 5th International Symposium on Quality Electronic Design (ISQED'04), 2004
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