loading...
A Practical Transistor-Level Dual Threshold Voltage Assignment Methodology
San Jose, California March 21-March 23
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/ISQED.2005.13Sixth International Symposium on Qual ...
 This Article 
 
PDF
HTML
 
 Share 
   
 Bibliographic References 
   
 Add to: 
 
Digg
Furl
Spurl
Blink
Simpy
Google
Del.icio.us
Y!MyWeb
 
 Search 
   
Puneet Gupta, Blaze DFM, Inc., Sunnyvale, CA
Andrew B. Kahng, Blaze DFM, Inc., Sunnyvale, CA; UCSD, La Jolla, CA
Puneet Sharma, UCSD, La Jolla, CA
Leakage power has become one of the most critical design concerns for the system-level chip designer. Multi-threshold techniques have been used to reduce runtime leakage power without sacrificing performance. In this paper, we present an effective and scalable transistor-level Vth assignment approach and show leakage reduction over standard cell-level Vth assignment. The main disadvantage of transistor-level Vth assignment is increased cell library size and characterization effort. In comparison to previous approaches, our approach yields better solution quality, requires smaller cell library, is more accurate in considering the impact of Vth assignment on propagation delay, slew (transition delay) and capacitance, and is significantly faster.
Citation:
Puneet Gupta, Andrew B. Kahng, Puneet Sharma, "A Practical Transistor-Level Dual Threshold Voltage Assignment Methodology," isqed, pp.421-426, Sixth International Symposium on Quality of Electronic Design (ISQED'05), 2005
Usage of this product signifies your acceptance of the Terms of Use.