loading...
Strained Si and the Future Direction of CMOS, invited
Banff, Alberta, Canada July 20-July 24
DOI Bookmark: http://doi.ieeecomputersociety.org/10.1109/IWSOC.2005.99Fifth International Workshop on Syste ...
 This Article 
 
Buy PURCHASE ARTICLE: $19
PDF
HTML
Buy IEEE Xplore Subscribers
 
 Share 
   
 Bibliographic References 
   
 Add to: 
 
Digg
Furl
Spurl
Blink
Simpy
Google
Del.icio.us
Y!MyWeb
 
 Search 
   
ASCII Text
x 
 
Scott E. Thompson, "Strained Si and the Future Direction of CMOS, invited," System-on-Chip for Real-Time Applications, International Workshop on, pp. 14-16, Fifth International Workshop on System-on-Chip for Real-Time Applications (IWSOC'05), 2005.
 
 
BibTex
x
 
@article{ 10.1109/IWSOC.2005.99,
author = {Scott E. Thompson},
title = {Strained Si and the Future Direction of CMOS, invited},
journal ={System-on-Chip for Real-Time Applications, International Workshop on},
volume = {0},
year = {2005},
isbn = {0-7695-2403-6},
pages = {14-16},
doi = {http://doi.ieeecomputersociety.org/10.1109/IWSOC.2005.99},
publisher = {IEEE Computer Society},
address = {Los Alamitos, CA, USA},
}
 
 
RefWorks Procite/RefMan/Endnote
x 
 
TY - CONF
JO - System-on-Chip for Real-Time Applications, International Workshop on
TI - Strained Si and the Future Direction of CMOS, invited
SN - 0-7695-2403-6
SP14
EP16
A1 - Scott E. Thompson,
PY - 2005
KW - null
VL - 0
JA - System-on-Chip for Real-Time Applications, International Workshop on
ER -
 
Scott E. Thompson, University of Florida
Uniaxial process induced strain is being adopted in all 90, 65, and 45 nm high performance logic technologies. Uniaxial strain offers large performance improvement at low cost and minimally increased manufacturing complexity and is scalable to future technology nodes.
Citation:
Scott E. Thompson, "Strained Si and the Future Direction of CMOS, invited," iwsoc, pp.14-16, Fifth International Workshop on System-on-Chip for Real-Time Applications (IWSOC'05), 2005
Usage of this product signifies your acceptance of the Terms of Use.